sputter

He had forgotten the gentleman who sputtered in people's faces.

DC magnetron sputter deposition has generally been used in industrial production lines for the deposition of ITO films because this method yields homogeneous ITO films with low resistivity and good reproducibility.

Venkataraj, "Analysis of microstructure and surface morphology of sputter deposited molybdenum back contacts for CIGS solar cells," Procedia Engineering, vol.

The change of preferred orientation of the growth plane is known to be due to preferential sputtering of the atoms in different planes during the sputter deposition process.

The magnetized solar wind then picks up these ions, whirling them around and flinging some of them back into the atmosphere, where they collide with neutral atoms and molecules there--such as argon-36--and "sputter" them every which way, including out of the atmosphere entirely.

The novel gas krypton is used for increasing the sputter rate of Ti- and Al-atoms during the plasma ignition phase due to the high atom mass compared to argon and nitrogen.

To address this problem, we have proposed applying sputter epitaxy for [n.sup.+] emitter for SCs [8, 9].

[USPRwire, Fri Sep 25 2015] Sputter Coating Market by Target Material (Pure Material, Compound), by Substrate (Metal, Glass, Plastic, Semiconductor), by Application (Architecture, Electronics, Optical, Tribological & Decorative Coating) & by Geography - Global Forecast to 2020

For each sputter regime the deposition rate (nm/min) was determined.

Two witnesses saw the airplane lift off the runway and climb to approximately 20 feet agl when the engine began to "sputter." The airplane landed on the runway before initiating a second takeoff.

One of the most useful features often employed with AES in characterizing thin films and buried interfaces is a technique called sputter depth profiling (SDP).

Most publications have dealt with reactive magnetron sputter deposition and the characterization of the physical properties of the [Cu.sub.3]N films as a function of deposition parameters: nitrogen (partial) pressure in the gas mixture, (15-17) substrate temperature, (7), (18) and sputtering power.

The effect of substrate temperature on the crystallinity of sputter deposited HA films was studied by Nelea V, et al.

Another company that has prospered from the EU-backed project has been UK-based Teer Coatings, which has grown from a five-person company to a leading supplier of large-area sputter coaters.