MEI's Critical Etch
batch wet processing systems achieve comparable etch
uniformity, providing superior results when compared to single wafer spray tools for Cu and TiW Etch
Hitachi High Technologies America, headquartered in Schaumburg, IL, sells and services a full range of products for metrology, SOI wafer manufacturing, etch
, defect review and inspection and failure analysis.
The HRe(-) chamber enables us to etch
films on GaAs substrates at a low temperature with suitable etch
profile and selectivity to mask and under-layer," said Dr.
Featuring proprietary wafer temperature tuning, a tunable RF source and specialized etch
chemistry, the Applied Opus AdvantEdge( )metal etch
system delivers <5nm, 3 sigma CD uniformity for aluminum interconnects.
Able to etch
atom by atom -- at least in theory -- plasmas offer unparalleled precision.
Hitachi High-Technologies America's development work in advanced metal gate etch
applications primarily focuses on high speed logic below the hp90nm process node, which is anticipated to move into volume production later this year.
The Mask Etcher V(TM) platform provides enhanced ICP process solutions over previous systems, including improved particle control, ultra-low CD etch
bias and sub-7nm feature-size linearity.
We are pleased to be expanding the capabilities of our Omega etch
platform by adding this DSi module," said Prof.
Jiro Yamamoto, plant manager of Hiroshima Elpida Memory, said, "The key factor in our selection of the AdvantEdge Etch
system for our most advanced DRAM production was its unique tuning capability, which delivers superior process performance for a wide range of advanced memory applications.
Tegal is the leading company in plasma etch
technology for several types of non-volatile memory devices, such as FeRAM, MRAM, RRAM and polymeric memories," said Murali Narasimhan, Tegal's recently appointed Vice President of Marketing.
Popular applications include silicon nitride and oxide dielectric etch
in addition to a wide variety of polymer etch
Delivering world-class etch
performance, the system provides more than 50% better critical dimension (CD) uniformity, twice the strip rate with enhanced corrosion resistance, and at least 20% higher throughput than any other advanced metal etch
system on the market.
Veeco's new AFP is ideal for some of today's most challenging in-fab metrology applications such as chemical mechanical planarization (CMP), etch
depth, step heights, roughness and die maps for advanced technology nodes.
Tegal Corporation (Nasdaq:TGAL), a leading designer and manufacturer of plasma etch
and deposition systems used in the production of integrated circuits and nanotechnology devices, today announced the sale of a 901ACS diode plasma etch
system to a leading supplier of automotive electronics devices in Japan.
today launched the industry's most advanced silicon etch
technology, the Applied Centura(R) AdvantEdge(TM) system, delivering 2mm edge exclusion with sub-3nm CD (critical dimension) control across 300mm wafers.