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To find out, the researchers implanted into rats tiny screened cages, or diffusion chambers, containing a known number of leukemia cells.
Additionally, the larger process window created by expanding the effective operating ranges of the plasma source and diffusion chambers results in higher etching rates overall, a key enabler for DRIE tool productivity.
Patented TCP plasma source, a planar source that provides exceptionally uniform ion flux without requiring separate source and diffusion chambers - leading to high across-wafer uniformity of etch rate, profile shape and critical dimensions (CDs)
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